Insulator Deposition Mask, Low Density

Low Density Insulator Deposition Mask,

Enabling accurate deposition resolution

An evaporation mask for deposition of the insulator layer for use with Ossila's low-density OFET system.

Outer dimensions: 75 mm x 75 mm

Number of OFETs: 5 OFETs per substrate.

Mask with direct contact (no spacer): For sputtering and other non-directional deposition systems, as well as for thermal deposition systems with oblique angles or a very short throw, we recommend the use of the direct contact mask to get well-defined edges.

Mask with 100 μm spacer: For normal thermal evaporation systems we recommend the use of masks with the 100 μm spacer to help avoid scratches and allow better out-gassing.

Datasheet