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Insulator Deposition Mask, Low Density

Substrates and Fabrication

Low Density Insulator Deposition Mask,

Enabling accurate deposition resolution

An evaporation mask for deposition of the insulator layer for use with Ossila's low-density OFET system.

Outer dimensions: 75 mm x 75 mm

Number of OFETs: 5 OFETs per substrate.

Mask with direct contact (no spacer): For sputtering and other non-directional deposition systems, as well as for thermal deposition systems with oblique angles or a very short throw, we recommend the use of the direct contact mask to get well-defined edges.

Mask with 100 μm spacer: For normal thermal evaporation systems we recommend the use of masks with the 100 μm spacer to help avoid scratches and allow better out-gassing.

Datasheet

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