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Product Code L2001A3-U1-US
Price $2,633 ex. VAT

Low Price, Vacuum-Free Spin Coaters You Can Trust

Produce high-quality films without any substrate warping


Overview | Specifications | Features | Gallery | In the Box | Resources and Support


The vacuum-free Ossila Spin Coater is ideal for spin coating in busy, fast-paced labs where space is at a premium. The system is robust, affordable, and trusted by academics and researchers around the world. Choose between two models to select the right specifications for your research. Both include inbuilt controls which allow you to save 10 user profiles, perfect for shared research facilities.

Our advanced model is ideal for complex, high precision spin coating processes that require long spin cycles and spin speeds up to 10,000 rpm. With a speed stability error margin of less than 0.25%, you can have confidence in a consistent and reliable coating process that produces high quality thin films.

An all-in-one spin coater chuck is included as standard, or you can upgrade to a PTFE or PEEK chuck for enhanced chemical resistance. Using fluid dynamics simulations, our spin coater chuck has improved air flow dynamics and mechanical performance at high speeds. For controllable, automated dispensing of solvents, our spin coaters are also available with either our single syringe pump or dual syringe pump at a discounted price as part of the Ossila Spin Coating Kit.

Vacuum-free spin coater

Vacuum-Free

Innovative chuck design

Spin coater with a range of speeds

Range of Speeds

Up to 6,000 or 10,000 rpm

Long spin coating cycles

Long Spin Cycles

Up to 1,000 or 3,600 seconds

Lab proof system

Built to Last

Durable & chemical-resistant

We recently purchased an Ossila Spin Coater. Its compact size and vacuum-free system is ideal for our rather over-crowded laboratory, and it has enabled us to prepare a series of high-quality block copolymer thin films. The chucks make it easy to use different substrates and we have programmed several spin cycles, which allows systematic variation of the copolymer film thickness with good reproducibility.

Professor Steve Armes FRS, Professor of Polymer and Colloid Chemistry, University of Sheffield

Specifications



Standard Model Advanced Model
Speed stability <2% error <0.25% error
Speed 120 – 6,000 RPM 500 – 10,000 RPM
Spin time 1 – 1,000 sec 1 – 3,600 sec
User Profiles 10 15
Materials Polypropylene bowl, steel casing, tempered glass lid PTFE bowl, powder coated steel casing, tempered glass lid
Weight 2.75 kg 3.7 kg

Additional Specifications

Max Substrate Size 100 mm (4") diameter
Programs 10 programs on each user profile, with up to 50 steps each
Safety Switch Magnetic safety switch on the door
Additional Features Built-in spirit level and adjustable feet
Dimensions (D x W x H) 225 mm x 170 mm x 140 mm (8.86" x 6.69" x 5.51")
Power supply DC 24 V 2 A, via 100–240 V 50/60 Hz power adapter

Spin Coater Features


Easy to install

Vacuum-Free

With no vacuum or nitrogen line to connect, simply plug the spin coater into a power socket to get started on your research. Ossila spin coaters can produce uniform films with zero substrate warping or damage, even when coating flexible substrates.

Large range of speeds

Large Range of Speeds

In our standard model, spin speeds range from 120 to 6,000 rpm, covering a range of different spin coating conditions—from slow dry crystallisation, to ultra-thin films. Or choose the advanced model for spin speeds from 500 to 10,000 rpm with an error margin of 0.25% for electronics, optics, and coating with high viscosity materials.

Spin cycles up to an hour

Long Spin Cycles

With our advanced model, extend your spin cycles up to 3600 seconds to achieve better solvent evaporation and more controlled layer formation. Useful for multilayer coatings and graded film properties in the development of advanced materials, and biocompatibility in biotechnology applications.

All-in-one chuck design

Multi-Substrate Chuck

The all-in-one design holds four common substrate sizes without the need to switch between chucks. The chuck improves airflow over the substrate, reduces solvent build up, while ensuring mechanical stability at extremely high rotational speeds. Or, upgrade to a PTFE or PEEK chuck for enhanced chemical resistance.

Fewer variables, better films

Durable and Chemical-Resistant Materials

Both models are constructed with materials that ensure high chemical resistance, prolonging the lifetime of the system. For enhanced durability, the advanced model comes equipped with a PTFE bowl and chuck as standard, with an optional upgrade to a PEEK chuck for even greater resilience.

Full control

Full Control

The inbuilt control system allows you to have 10 separate user profiles — with each profile capable of saving 10 recipes with up to 50 steps. All this makes our spin coaters perfect for anyone that has to share equipment in a busy lab.

Fewer variables, better films

Fewer Variables, Better Films

The inbuilt spirit level and adjustable feet ensure a flat spinning axis, and the vacuum-free chuck prevents warping in thin substrates. Both factors lead to better uniformity in films — and better device performance.

I use a Contact Angle Goniometer and Spin Coater from Ossila, the best tools I have ever used for the application of Perovskite solar cells. I plan to order more devices from the same brand.

Ashique Kotta, Jeonbuk National University

Why Go Vacuum-Free?


Many spin coaters in the market use vacuum pumps to hold substrates while they spin. The Ossila Spin Coater uses an innovative chuck design that does not require a vacuum. Substrates are held in place by recesses cut into a chuck, allowing excess coating material to be drained away.

Thin substrates are likely to be warped inwards by vacuum chucks, affecting coating uniformity. The force of vacuum on the solutions deposited on top of porous substrates, such as ceramics, also leads to inhomogeneity. This reduces the quality and performance of devices. Our vacuum-free chucks ensure an even film distribution by keeping your substrates flat and free from damage, even if they are flexible substrates.

Thin film warping caused by spin coater vacuum The Ossila vacuum-free Spin Coater gives even film distribution Vacuum-free spin coater chuck
Substrate warping as a result of a vacuum seal ring on standard spin coater (left). Our vacuum-free spin coater gives an even film distribution (middle) using an innovative chuck to hold the substrate in place during the spin cycle (right).

Without a vacuum line, the Ossila Spin Coater can be set up anywhere with a single mains socket. Spin coat on a lab bench, in a fume hood, or a glove box, all in the same day thanks to its easy setup and compact size.

Most spin coaters are also burdened by the hidden cost of vacuum pumps that are usually excluded from the full system price. Vacuum pumps are prone to breaking, which results in expensive repairs and delays. This is mainly caused by excess solvents being sucked into the vacuum line, damaging the internal components. Short-term and long-term costs can be reduced by using the vacuum-free Ossila Spin Coater, which gives you everything you need to start spin coating.


In the Box


  • Ossila Spin Coater
  • Multi-substrate spin coater chuck
  • Power supply

Resources and Support


The Ossila Spin Coater Which Spin Coater Features Do I Need?

The Ossila Spin Coater is designed to be simple and effective for R&D and laboratory applications. We offer an affordable model that is optimized to last and create uniform films.

Read more...
Spin coater chuck design Reinventing the Spin Coater Chuck

The bigger, better chuck provides an all-in-one solution if you have multiple sizes of substrates to coat. Plus improved aerodynamics and mechanical performance produce more uniform films.

Read more...
The Ossila Spin Coater Advanced Spin Coater Advanced: Upgrades and Specifications

The advanced model offers more control than the classic spin coater in a wide range of areas. These advancements make it ideal for high-precision and demanding applications.

Read more...
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