Active Area Deposition Mask, High Density

High Density Active Area Deposition Mask

for use with Ossila's high-density OFET system

An evaporation mask for deposition onto the active area of a device, for use with Ossila's high-density OFET system.
Outer dimensions: 75 mm x 75 mm
Number of OFETs: 20 per substrate.

Mask with direct contact (no spacer): For sputtering and other non-directional deposition systems, as well as for thermal deposition systems with oblique angles or a very short throw, we recommend the use of the direct contact mask to get well-defined edges.

Mask with 100 μm spacer: For normal thermal evaporation systems we recommend the use of masks with the 100 μm spacer to help avoid scratches and allow better out-gassing.

Datasheet