Insulator Deposition Mask, High Density

A mask for deposition of the insulator layer

for use with Ossila's high density OFET system

Outer dimensions: 75 mm x 75 mm

Number of OFETs: 20 per substrate.

Mask with direct contact (no spacer): For sputtering and other non-directional deposition systems, as well as for thermal deposition systems with oblique angles or a very short throw, we recommend the use of the direct contact mask to get well-defined edges.

Mask with 100 μm spacer: For normal thermal evaporation systems we recommend the use of masks with the 100 μm spacer to help avoid scratches and allow better out-gassing.

Datasheet